Our Business

Energy-Filtered Ion Implantation

We’re developing and supplying a highly innovative tool for manufacturing efficient power semiconductor microchips.

Our Energy-Filter has been specially developed for doping new microchips made of silicon carbide (SiC), a material that represents a huge technological leap for wind power, photovoltaics and electromobility. Our technology enables novel designs, reduces costs and increases the performance and yield of microchips.

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Processing SiC Power Microchips

The Energy-Filter technology revolutionizes the manufacturing of power microchips by eliminating the need for conventional, complex and time-consuming ion implantation processes. Thus enabling faster process time, higher throughput and maintaining accurate doping homogeneity from wafer to wafer.

Your Benefits

Our experience … your benefits

The Energy-Filter technology enables the following for your microchips:

cost reduction

design innovation

performance boost

Management Team

Prof. Dr. Michael Rüb
CEO & Managing Director

M.Eng. Benjamin Tom
CFO & Managing Director

Our Vision


EFII© will be established as enabling technology for superjunction MOS transistors for wind power, photovoltaics, electric vehicles, thus contributing to achieve the climate targets.

Process Technology

EFII© will be established as a standard SiC specific industrial processing technique, like capped annealing gas phase wafer growth.

Implantation Equipment

EFII© will foster the industrial application of high energy ion implantation by allowing simplified equipment.