We

improve

future

technologies.

We develop a highly innovative tool for

silicon carbide power microchip

manufacturing.

We

improve

future

technologies.

We develop a highly innovative tool for

silicon carbide power microchip

manufacturing.

WHAT IS OUR

BUSINESS

?

Energy-Filter for Ion Implantation (EFII©)

We're developing and supplying a highly innovative tool
for manufacturing efficient power semiconductor microchips.

Our Energy-Filter has been specially developed for doping new microchips
made of silicon carbide (SiC), a material that represents a huge technological
leap for wind power, photovoltaics and electromobility. Our technology enables
novel designs, reduces costs and increases the performance and yield of microchips.

Why silicon carbide?

Silicon carbide wafer
for power microchips

Energy-Filter for
Ion Implantation

Ion beam

WHAT IS OUR

BUSINESS

?

Energy-Filter for Ion Implantation (EFII©)

We're developing and supplying a highly innovative tool
for manufacturing efficient power semiconductor microchips.

Our Energy-Filter has been specially developed for
doping new microchips made of silicon carbide (SiC),
a material that represents a huge technological leap for
wind power, photovoltaics and electromobility. Our technology
enables novel designs, reduces costs and increases the
performance and yield of microchips.

Silicon carbide wafer
for power microchips

Energy-Filter for
Ion Implantation

Ion beam

BENEFITS OF

SILICON CARBIDE

Lower system cost

Reduced system size

Higher power density

Increased performance

Reduced losses

Higher switching frequencies

Due to its superior technical features compared to Silicon, SiC enables a
significant reduction of energy losses in electrical power converters. Its potential
to reduce systems sizes, system weights and switching losses establish its attractiveness for
mass applications like electric vehicles and renewable energy as well as many other important applications.

POWER MICROCHIPS

WHY CHOOSE

ENERGY-FILTER

TECHNOLOGY?

Chip cost reduction

Chip size shrink potential

Low process cost

Excellent reproducibility

Energy-Filter technology enables
up to 50% chip cost reduction for
SiC power devices, depending on
voltage class and chip architecture.

Highly precise Energy-Filter technology
features excellent reproducibility for
tight device parameter distribution.

Highly precise Energy-Filter technology enables
chip size shrink of up to 80%, depending on
voltage class and chip architecture.

Energy-Filter technology features
surprising low processing cost.

Innovative SiC power chip architectures

Novel implantation equipment - EFIITRON

Energy-Filter technology enables for the first time scalable
production of complex 3D-SiC doping chip architectures.

Energy-Filter technology enables to introduce a novel simplified
approach to high energy ion implantation equipment for
semiconductor processing, the EFIITRON machine.

YOUR

BENEFITS

Chip cost reduction

Chip size shrink potential

Low process cost

Excellent reproducibility

Energy-Filter technology enables up to 50% chip cost reduction for
SiC power devices, depending on voltage class and chip architecture.

Highly precise Energy-Filter technology features
excellent reproducibility for tight device parameter distribution.

Highly precise Energy-Filter technology enables chip size
shrink of up to 80%, depending on voltage class and chip architecture.

Energy-Filter technology
features surprising low processing cost.

Innovative SiC power chip architectures

Novel implantation equipment - EFIITRON

Energy-Filter technology enables for the first time
scalable production of complex 3D-SiC doping chip architectures.

Energy-Filter technology enables to introduce a
novel simplified approach to high energy ion implantation
equipment for semiconductor processing, the EFIITRON machine.

WHERE IS OUR

FOCUS

?

Energy-Filter technology facilitates complex and time-consuming
ion implantation processes for manufacturing power microchips.

Experience the

NEXT LEVEL

for processing your power microchips.

R&D Centers

Wafer Production

Chip Processing

Integration

Enduser

WHERE IS OUR

FOCUS

?

Energy-Filter technology facilitates complex and time-consuming
ion implantation processes for manufacturing power microchips.

Chip Processing

Experience the

NEXT LEVEL

for processing your power microchips.

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International patent
applications pending

National patents
granted

National patents
pending

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MANAGEMENT

TEAM


M.Sc. Florian Krippendorf

Managing Director, CTO

M.Eng. Benjamin Tom

Managing Director, CFO

Prof. Dr. Michael Rüb

Business Development

MANAGEMENT

TEAM


M.Sc. Florian Krippendorf

Managing Director, CTO

M.Eng. Benjamin Tom

Managing Director, CFO

Prof. Dr. Michael Rüb

Business Development
Slide thumbnail

WHAT ARE OUR

VISIONS

?

Device

Process Technology

Implantation Equipment

EFII© will be established as enabling
technology for superjunction MOS transistors
for wind power, photovoltaics, electric vehicles,
thus contributing to achieve the climate targets.

EFII© will be established as a standard
SiC specific industrial processing technique,
like capped annealing gas phase wafer growth.

EFII© will foster the industrial application
of high energy ion implantation by allowing
simplified equipment.

Together with you we are working for a

SUSTAINABLE FUTURE

!

WHAT ARE OUR

VISIONS

?

Device

Process Technology

Implantation Equipment

EFII© will be established as enabling
technology for superjunction MOS transistors
for wind power, photovoltaics, electric vehicles,
thus contributing to achieve the climate targets.

EFII© will be established as a standard
SiC specific industrial processing technique,
like capped annealing gas phase wafer growth.

EFII© will foster the industrial application
of high energy ion implantation by allowing
simplified equipment.