Our Business

Energy-Filtered
Ion Implantation

We’re developing and supplying a highly innovative tool for manufacturing efficient power semiconductor microchips.

Our Energy-Filter has been specially developed for doping new microchips made of silicon carbide (SiC), a material that represents a huge technological leap for wind power, photovoltaics and electromobility. Our technology enables novel designs, reduces costs and increases the performance and yield of microchips.

Our Focus

Processing SiC
Power Microchips

The Energy-Filter technology facilitates complex and time-consuming ion implantation processes for manufacturing power microchips.

Our Experience
… Your Benefits.

We offer various benefits for our customers. The Energy-Filter technology enables cost reduction, design innovation and performance boost for your microchips.

Chip Cost Reduction

The Energy-Filter technology enables up to 50% chip cost reduction for SiC power devices, depending on voltage class and chip architecture.

Excellent Homogeneity

Excellent Reproducibility

The highly precise Energy-Filter technology features excellent reproducibility for tight device parameter distribution.

Chip Size Shrink Potential

The highly precise Energy-Filter technology enables chip size shrink of up to 80%, depending on voltage class and chip architecture.

+8

national patents granted

+6

national patents pending

+15

international patents granted

+25

international patents pending

Management Team

Dr. Florian Krippendorf
Managing Director, Tech

M.Eng. Benjamin Tom
Managing Director, Finance

Prof. Dr. Michael Rüb
Business Development

Our Vision

Device

EFII© will be established as enabling technology for superjunction MOS transistors for wind power, photovoltaics, electric vehicles, thus contributing to achieve the climate targets.

Process Technology

EFII© will be established as a standard SiC specific industrial processing technique, like capped annealing gas phase wafer growth.

Implantation Equipment

EFII© will foster the industrial application of high energy ion implantation by allowing simplified equipment.