
Your innovative company for manufacturing
SILICON CARBIDE POWER MICROCHIPS








SILICON CARBIDE
POWER MICROCHIPS
Your innovative company
for manufacturing
WHAT IS OUR
BUSINESS
?
Energy-Filter for Ion Implantation (EFII©)
We're developing and supplying a highly innovative tool
for manufacturing efficient power semiconductor microchips.
Our Energy-Filter has been specially developed for doping new microchips
made of silicon carbide (SiC), a material that represents a huge technological
leap for wind power, photovoltaics and electromobility. Our technology enables
novel designs, reduces costs and increases the performance and yield of microchips.

Silicon carbide wafer
for power microchips
Energy-Filter for
Ion Implantation
Ion beam
WHAT IS OUR
BUSINESS
?
Energy-Filter for Ion Implantation (EFII©)
We're developing and supplying a highly innovative tool
for manufacturing efficient power semiconductor microchips.
Our Energy-Filter has been specially developed for
doping new microchips made of silicon carbide (SiC),
a material that represents a huge technological leap for
wind power, photovoltaics and electromobility. Our technology
enables novel designs, reduces costs and increases the
performance and yield of microchips.

Silicon carbide wafer
for power microchips
Energy-Filter for
Ion Implantation
Ion beam

BENEFITS OF
SILICON CARBIDE
Lower system cost
Reduced system size
Higher power density
Increased performance
Reduced losses
Higher switching frequencies






Due to its superior technical features compared to Silicon, SiC enables a
significant reduction of energy losses in electrical power converters. Its potential
to reduce systems sizes, system weights and switching losses establish its attractiveness for
mass applications like electric vehicles and renewable energy as well as many other important applications.
POWER MICROCHIPS

WHY CHOOSE
ENERGY-FILTER
TECHNOLOGY?







Chip cost reduction
Chip size shrink potential
Low process cost
Excellent reproducibility
Energy-Filter technology enables
up to 50% chip cost reduction for
SiC power devices, depending on
voltage class and chip architecture.
Highly precise Energy-Filter technology
features excellent reproducibility for
tight device parameter distribution.
Highly precise Energy-Filter technology enables
chip size shrink of up to 80%, depending on
voltage class and chip architecture.
Energy-Filter technology features
surprising low processing cost.
Innovative SiC power chip architectures
Novel implantation equipment - EFIITRON
Energy-Filter technology enables for the first time scalable
production of complex 3D-SiC doping chip architectures.
Energy-Filter technology enables to introduce a novel simplified
approach to high energy ion implantation equipment for
semiconductor processing, the EFIITRON machine.

YOUR
BENEFITS






Chip cost reduction
Chip size shrink potential
Low process cost
Excellent reproducibility
Energy-Filter technology enables up to 50% chip cost reduction for
SiC power devices, depending on voltage class and chip architecture.
Highly precise Energy-Filter technology features
excellent reproducibility for tight device parameter distribution.
Highly precise Energy-Filter technology enables chip size
shrink of up to 80%, depending on voltage class and chip architecture.
Energy-Filter technology
features surprising low processing cost.
Innovative SiC power chip architectures
Novel implantation equipment - EFIITRON
Energy-Filter technology enables for the first time
scalable production of complex 3D-SiC doping chip architectures.
Energy-Filter technology enables to introduce a
novel simplified approach to high energy ion implantation
equipment for semiconductor processing, the EFIITRON machine.
WHERE IS OUR
FOCUS
?
Energy-Filter technology facilitates complex and time-consuming
ion implantation processes for manufacturing power microchips.
Experience the
NEXT LEVEL
for processing your power microchips.









R&D Centers
Wafer Production
Chip Processing
Integration
Enduser
WHERE IS OUR
FOCUS
?
Energy-Filter technology facilitates complex and time-consuming
ion implantation processes for manufacturing power microchips.

Chip Processing
Experience the
NEXT LEVEL
for processing your power microchips.





International patent
applications pending
National patents
granted
National patents
pending
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MANAGEMENT
TEAM



M.Sc. Florian Krippendorf
Managing Director, CTO
M.Eng. Benjamin Tom
Managing Director, CFO
Prof. Dr. Michael Rüb
Business Development
MANAGEMENT
TEAM



M.Sc. Florian Krippendorf
Managing Director, CTO
M.Eng. Benjamin Tom
Managing Director, CFO
Prof. Dr. Michael Rüb
Business Development

WHAT ARE OUR
VISIONS
?
Device
Process Technology
Implantation Equipment
EFII© will be established as enabling
technology for superjunction MOS transistors
for wind power, photovoltaics, electric vehicles,
thus contributing to achieve the climate targets.
EFII© will be established as a standard
SiC specific industrial processing technique,
like capped annealing gas phase wafer growth.
EFII© will foster the industrial application
of high energy ion implantation by allowing
simplified equipment.
Together with you we are working for a
SUSTAINABLE FUTURE
!

WHAT ARE OUR
VISIONS
?
Device
Process Technology
Implantation Equipment
EFII© will be established as enabling
technology for superjunction MOS transistors
for wind power, photovoltaics, electric vehicles,
thus contributing to achieve the climate targets.
EFII© will be established as a standard
SiC specific industrial processing technique,
like capped annealing gas phase wafer growth.
EFII© will foster the industrial application
of high energy ion implantation by allowing
simplified equipment.