mi2-factory GmbH develops a special chamber for a wafer endstation. This project has two main goals:
1. Increase of troughput for application of energy-filter technology for ion implantation
2. Precise process control for energy-filter technology
Because of strategical reasons mi2-factory GmbH wants to gain (especially female and international) staff für R&D activites. The student from EAH Jena therefore is suitable very well, because of her studies in the field of Scientific Instrumentation. Furthermore she has comprehensive language knowledge, she is interested in the working field of mi2-factoy GmbH and already has practical experience in research and industrial sector. Because of that mi2-factory GmbH would like to get to know the student and wants to support her during her studies.
mi2-factory GmbH gets funding for office equipment, software and technical equipment. Goal is to support the company with basis equipment for the business activities.
mi2-factory develops specialized energy-filtered ion implantation for production of periodical refractive index modified areas in non-photosensitive material.
mi2-factory develops a new kind of filter design.
This project is financed by the state Thuriniga and co-financed by the European Union with the EFRE-fund.
mi2-factory takes part in an international conference.
mi2-factory is exhibitor on a national semiconductor trade fair.